3

Annealing behaviour of ion implanted crystalline copper

Year:
1990
Language:
english
File:
PDF, 101 KB
english, 1990
4

A method for ion etching depth control

Year:
1992
Language:
english
File:
PDF, 819 KB
english, 1992
5

Ion sputtering targets electrolytically prepared

Year:
1986
Language:
english
File:
PDF, 180 KB
english, 1986
13

Low-Energy Broad-Beam Sputter Deposition of TiNx Thin Films

Year:
2002
Language:
english
File:
PDF, 465 KB
english, 2002
14

Design of an apparatus for low-energy ion scattering from solid surfaces

Year:
1977
Language:
english
File:
PDF, 439 KB
english, 1977